1. Magnetron sputtering coating is much better than arc ion coating, and there are less coarse droplet particles.

2. The film-substrate bonding force is better than that of vacuum evaporation coating. In the vacuum evaporation coating technology, the energy of the atoms in the film layer is only the heat energy carried during evaporation, which is equivalent to 00.1~0.2eV; while in the magnetron sputtering coating technology, the energy of the film layer particles is generated by the argon ions and the surface atoms of the target. The exchange and momentum exchange can improve the membrane-base binding force.

3. The composition of the film layer is close to the target material. The film layer of magnetron sputtering is sputtered from the target by argon ions, and the composition of the film layer is very close to that of the target material. The resulting "fractionation" or "decomposition" phenomenon is relatively light compared with evaporation plating. However, generally when coating a functional film with very strict performance requirements, a certain amount of reactive gas must be added during the sputtering process to make the compound film composition of the film meet the stoichiometric ratio to ensure the performance requirements of the film.

4. The coating has good coating performance. The vacuum pressure of sputtering coating is low. The free path of gas molecules is short, the collision probability is high, and compared to evaporation coating, the scattering ability of film particles is strong, the coating performance is good, and the film thickness is uniform.

5. Sputtering target is an area type coating source. The length of both the plane Magnetron sputtering target and the cylindrical magnetron target can reach 300~3000 mm. Although both are linear coating sources, coupled with the continuous movement of the workpiece, it can be coated on a large area of parts. If a film is coated on a glass surface with a width of 3300mm, a uniform film layer with different colors and transmittance can be obtained. Magnetron sputtering has been widely used in depositing large area thin films.

6. Use bias voltage to the workpiece. At first, in the Magnetron sputtering technology. Nowadays, magnetron sputtering coating technology is widely used on metal substrates, and applying negative bias voltage to the workpiece to improve the quality of the film layer has become the mainstream technology for coating special functional films and high-end decorative products.